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Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Author(s):
Hong,S. ( Korea Advanced Institute of Science and Technology )
Kim,E.
Jiang,Z.-T.
Bae,B.-S.
No,K.
Shin,W.
Lim,S.-C.
Woo,S.-G.
Koh,Y.-B.
4 more
Publication title:
Photomask and X-Ray Mask Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2793
Pub. date:
1996
Page(from):
134
Page(to):
137
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421791 [0819421790]
Language:
English
Call no.:
P63600/2793
Type:
Conference Proceedings

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