Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Author(s):

Hong,S. ( Korea Advanced Institute of Science and Technology )

Publication title:

Photomask and X-Ray Mask Technology III

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2793

Pub. Year:

1996

Page(from):

134

Page(to):

137

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421791 [0819421790]

Language:

English

Call no.:

P63600/2793

Type:

Conference Proceedings

Details

TDL ID:	ZA00017954
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1996 : 3rd
Conf. info. (Venue):	Kawasaki City, Kanagawa, Japan
Conf. info. (Date):	1996.04.18-1996.04.19

Similar Items:

1 Conference Proceedings Stability of CrFx films for phase-shifting mask Kim,E., Hong,S., Jiang,Z.-T., Lim,S., Woo,S.-G., Koh,Y.-B., No,K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure K. Mikami, H. Mohri, H. Miyashita, N. Hayashi, H. Sano Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Chromium-based attenuated phase shifter for DUV exposure H. Mohri, M. Takahashi, K. Mikami, H. Miyashita, N. Hayashi Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions S.-C. Lim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Application of alternating phase-shifting masks to 200-nm contact holes Lim,S.-C., Woo,S.-G., Park,C.-G., Koh,Y.-B. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Second level exposure for phase shift mask applications using an SLM-based DUV mask writer [5853-134] Chandramouli, M., Olshausen, B., Korobko, Y., Henrichs, S., Qu, P., Ma, J., Auches, B., Cole, D., Ostrom, T., Beyerl, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Application of alternating phase shift mask to device fabrication S.-G. Kim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12