New concept for negative-tone electron-beam resist
- Author(s):
Wada,Y. ( Nippon Zeon Co.,Ltd. ) Kashiwagi,M. Tanaka,H. Kawata,A. Tanaka,K. Yamamoto,Y. - Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 70
- Page(to):
- 77
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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