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Manufacturing feasibility of OPC masks for 0.25-ヲフm rule devices

Author(s):
Kawahira,H. ( Sony Corp. )
Katsumata,M.
Tsudaka,K.
Ogura,A.
Tomita,M.
Nozawa,S.
1 more
Publication title:
Photomask and X-Ray Mask Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2793
Pub. date:
1996
Page(from):
22
Page(to):
33
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421791 [0819421790]
Language:
English
Call no.:
P63600/2793
Type:
Conference Proceedings

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