Mask technology for 0.18-ｦﾌm device generation

Mask technology for 0.18-ｦﾌm device generation

Author(s):

Sohn,J.M. ( Samsung Electronics Co.,Ltd. )
Choi,S.W.
Kim,B.G.
Cho,H.K.
Yoon,H.S.

Publication title:

Photomask and X-Ray Mask Technology III

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2793

Pub. Year:

1996

Page(from):

2

Page(to):

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421791 [0819421790]

Language:

English

Call no.:

P63600/2793

Type:

Conference Proceedings

Details

TDL ID:	ZA00017954
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1996 : 3rd
Conf. info. (Venue):	Kawasaki City, Kanagawa, Japan
Conf. info. (Date):	1996.04.18-1996.04.19

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