One-level gray-tone lithography:mask data preparation and pattern transfer

One-level gray-tone lithography:mask data preparation and pattern transfer

Author(s):

Reimer,K. ( Fraunhofer-Institut fur Siliziumtechnologie )
Quenzer,H.
Demmeler,R.
Wagner,B.

Publication title:

Micro-optical technologies for measurement, sensors, and microsystems : 12-13 June 1996, Besançon, France

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2783

Pub. Year:

1996

Page(from):

71

Page(to):

79

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421692 [0819421693]

Language:

English

Call no.:

P63600/2783

Type:

Conference Proceedings

Details

TDL ID:	ZA00017953
Series ID:	PA00000029
Conf. info. (Name):	Lasers, Optics, and Vision for Productivity in Manufacturing : Micro-Optical Technologies for Measurement, Sensors, and Microsystems
Conf. info. (Number):	1996
Conf. info. (Venue):	Besançon, France
Conf. info. (Date):	1996.06.12-1996.06.13

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