TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

Author(s):

Publication title:

Reactive phase formation at interfaces and diffusion processes : proceedings of the International Meeting held in Aussois (France), May 21 - 28, 1993

Title of ser.:

Materials science forum

Ser. no.:

155-156

Pub. Year:

1994

Page(from):

111

Page(to):

120

Pub. info.:

Aedermannsdorf: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496808 [0878496807]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00017900
Series ID:	PA00000012
Conf. info. (Name):	Reactive Phase Formation at Interfaces and Diffusion Processes : International Meeting
Conf. info. (Number):	1993
Conf. info. (Venue):	Aussois, France
Conf. info. (Date):	1993.05.21-1993.05.28

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