Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data

Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data

Author(s):

Niu,X. ( Univ.of California/Berkeley )
Jakatdar,N. ( Univ.of California/Berkeley )
Spanos,C.J. ( Univ.of California/Berkeley )

Publication title:

Flatness, roughness, and discrete defects characterization for computer disks, wafers, and flat panel displays II : 29-30 January 1998, San Jose, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3275

Pub. Year:

1998

Page(from):

172

Page(to):

179

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427144 [0819427144]

Language:

English

Call no.:

P63600/3275

Type:

Conference Proceedings

Details

TDL ID:	ZA00017860
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays
Conf. info. (Number):	1998 : 2nd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1998.01.29-1998.01.30

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