ArF lasers for production of semiconductor devices with CD <0.15 ｦﾌm

ArF lasers for production of semiconductor devices with CD <0.15 ｦﾌm

Author(s):

Duffey,T.P. ( Cymer,Inc. )

Embree,T.J. ( Cymer,Inc. )

Ishihara,T. ( Cymer,Inc. )

Morton,R.G. ( Cymer,Inc. )

Partlo,W.N. ( Cymer,Inc. )

Watson,T.A. ( Cymer,Inc. )

Sandstrom,R.L. ( Cymer,Inc. )

2 more

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

1014

Page(to):

1020

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

Similar Items:

1 Conference Proceedings Feasibility of highly line-narrowed F2 laser for 157-nm microlithography Ershov,A.I., Duffey,T.P., Onkels,E., Partlo,W.N., Sandstrom,R.L. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Optical proximity correction for 0.15-ｦﾌm-rule memory devices Iwasaki,H., Tanabe,H., Inoue,T., Tanaka,Y. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Dependence of compaction in fused silica on laser pulsewidth at 248 nm Sandstrom,R.L., Morton,R.G., Duffey,T.P. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Comparison of ArF and KrF laser performance at 2 kHz for microlithography Besaucele,H., Das,P.P., Duffey,T.P., Embree,T.J., Ershov,A.I., Fleurov,V.B., Grove,S.L., Melcher,P.C., Ness,R., … SPIE - The International Society for Optical Engineering
3 Conference Proceedings ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes Mulkens,J., Stoeldraijer,J.M., Davies,G., Dierichs,M., Heskamp,B., Moers,M.H., George,R.A., Roempp,O., Glatzel,H., … SPIE - The International Society for Optical Engineering	9 Conference Proceedings 0.15-ｦﾌm pattern formation using cell projection electron-beam direct writing with variable shot size Tamura,T., Yamashita,H., Nakajima,K., Nozue,H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography Morton,R.G., Fomenkov,I.V., Partlo,W.N., Das,P.P., Sandstrom,R.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Optimizing of thin-film interference effects in KrF lithography for 0.15-ｦﾌm design rules Oh,S.-C., Kim,Y.-C., Nah,S.-H., Huh,H., Han,S.-B. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Illumination condition and mask bias for 0.15-ｦﾌm pattern with KrF and ArF lithography Tabuchi,H., Shichijo,Y., Oka,N., Takenaka,N., lguchi,K. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography, Choi,S.S., Jeon,Y.J., Lyu,J.-S., Yoo,H.J., Fabrizio,E.D., Grella,L., Gentili,M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-ｦﾌm line widths Ershov,A.I., Hofmann,T., Partlo,W.N., Fomenkov,I.V., Everage,G., Das,P.P., Myers,D. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Impact of MEF on 0.15-ｦﾌm KrF lithography Iwasaki,H., Tanabe,H. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12