Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves
- Author(s):
- Kwon,J.H. ( Yeungnam Univ.(Korea) )
- Sohn,Y.J. ( Yeungnam Univ.(Korea) )
- Hwang,H.C. ( Yeungnam Univ.(Korea) )
- Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) )
- Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
- Publication title:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3334
- Pub. Year:
- 1998
- Page(from):
- 971
- Page(to):
- 977
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- Language:
- English
- Call no.:
- P63600/3334
- Type:
- Conference Proceedings
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