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Alignment system for ArF excimer-laser-based step-and-scan system

Author(s):
Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,J.S. ( Electronics and Telecommunications Research Institute (Korea) )
Sohn,Y.J. ( Electronics and Telecommunications Research Institute (Korea) )
Kwon,J.H. ( Yeungnam Univ.(Korea) )
Lee,K.H. ( Electronics and Telecommunications Research Institute (Korea) )
Choi,S.-S. ( Electronics and Telecommunications Research Institute (Korea) )
Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
Yoo,H.J. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
4 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
958
Page(to):
970
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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