Blank Cover Image

Application of substructuring method to three-dimensional optical lithography simulation

Author(s):
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
795
Page(to):
802
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Development of an integrated 3D lithography simulator

Seo,C.-K., Lee,S.G., Lee,J.-U.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Fabrication and characterization of InGaN Nano-scale dots for blue and green LED applications

Kim, K. S., Hong, C-H., Lee, W-H., Kim, C. S., Cha, O. H., Yang, G. M., Suh, E-K., Lim, K. Y., Lee, H. J., Cho, H. K., …

MRS-Materials Research Society
2 Conference Proceedings Application of an effective wavelet matrix transform approach for optical lithography simulation:analysis of topological effects of phase-shifting masks

Lee,S.G., Kim,H.-J., Lee,D.-H., Lee,J.-U.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Design, fabrication, and intergration of micro/nano-scale optical waveguide arrays and devices for optical printed circuit board (O-PCB) and VLSI …

Lee, E.-H., Lee, S.G., Kim, B.H.O.K.H., Kang, J.K., Kwon, Y.K., Chin, I.-J., Cho, Y.W., Song, S.H.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings More stable algorithm for rigorous coupled-wave analysis applied to topography simulation in optical lithography and its numerical implementation

Lee,S.G., Lee,K.-I., Lee,J.-U., Choi,Y., Kim,H.-S.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Compensation of intrafield registration error caused by process properties in optical lithography

Lee,T.-G., Moon,S.-C., Lee,H.-M., Kim,J.-S., Lee,C.-S., Kim,H.-Y., Park,H.-K.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Optimal design of antireflective layer for DUV lithography and experimental results

Lee,S.G., Lee,K.-I., Seo,C.-K., Lee,J.-U., Choi,Y., Nam,B., Yu,J.Y., Jeong,J.-K.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings First microprocessors with immersion lithography

Lee, D.-Y., Kim, I.-S., Jung, S.-G., Jung, M.-H., Park, J.-O., Oh, S.-H., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Embodiment of optical interconnection circuits for the mobile phone application

J.-W. Seo, S.-M. Seo, Y.-K. Oh, D.-H. Jang

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography

Lee, J.-B., Park, J.-H., Seo, D.-C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Joo, H.-S., Jeon, H.-P., Kim, S.-J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Three-dimensional scanning optical tweezers [6048-04]

Hwang S.-U, Park I. -Y, Song J.-H, Lee Y. -G, LeBrun T., Dagalakis N., Gagnon C., Balijepali A.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12