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Novel approximate model for resist process

Author(s):
  • Ahn,C.-N. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Kim,H.-B. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Baik,K.-H. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
752
Page(to):
763
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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