Blank Cover Image

Cross-sectional critical shape error: a novel methodology for quantifying process simulation accuracy

Author(s):
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
729
Page(to):
738
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Process-specific tuning of lithography simulation tools

Mason,M.E., Soper,R.A., Terry,R.M., Mack,C.A.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Process Control Challenges in Semiconductor Manufacturing

Soper, R.

American Institute of Chemical Engineers
2 Conference Proceedings Improved method for the automated determination of E0 for lithography SPC

Mason,M.E., Soper,R.A., Garza,C.M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Antireflection coating process characterization and improvement for DUV lithography at 0.25 µm: ground rules

J.L. Sturtevant, M. Chaara, R. Elliot, L.D. Hollifield, R.A. Soper

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Rules based process window OPC

S. O'Brien, R. Soper, S. Best, M. Mason

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Effect of hole shape error on lithography process window

Kumar,R., Mukherjee-Roy,M., Tan,C.-H.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm [6349-70]

Mason, M., Best, S., Zhang, G., Terry, M., Soper, R.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings methodology of a Cross-sectional Nation-wide Growth Study

van Wieringen C. J., Roede J. Machteld

Plenum Press
5 Conference Proceedings Quantification of cross-sectional artery wall motion with IVUS image registration

Oakeson, K.D., Zhu, H., Friedman, M.H.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Noncontact electrical critical dimensions metrology sensor for chrome photomasks

Guillaume,N., Lahti,M., Cresswell,M.W., Allen,R.A., Linholm,L.W., Zaghloul,M.E.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Lithographic effects of mask critical dimension error

Wong,A.K., Ferguson,R.A., Liebmann,L.W., Mansfield,S.M., Molless,A.F., Neisser,M.O.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings A new methodology for quantifying OPC recipe accuracy [5992-180]

Ziger, D., Gerold, D., King, C., Amoroso, F., Tuttle, J., Lugg, R.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12