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NA optimization of 360-nm and 300-nm pitch devices

Author(s):
Kim,H. ( Samsung Electronics Co.,Ltd. (Korea) )
Kim,S. ( Samsung Electronics Co.,Ltd. (Korea) )
Kim,C. ( Samsung Electronics Co.,Ltd. (Korea) )
Hong,J. ( Samsung Electronics Co.,Ltd. (Korea) )
Lee,J. ( Samsung Electronics Co.,Ltd. (Korea) )
Kang,H. ( Samsung Electronics Co.,Ltd. (Korea) )
Moon,J. ( Samsung Electronics Co.,Ltd. (Korea) )
2 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. date:
1998
Page(from):
673
Page(to):
677
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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