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Assessment of optical coatings for 193-nm lithography

Author(s):
Liberman,V. ( MIT Lincoln Lab. )
Rothschild,M. ( MIT Lincoln Lab. )
Sedlacek,J.H.C. ( MIT Lincoln Lab. )
Uttaro,R.S. ( MIT Lincoln Lab. )
Grenville,A. ( Intel Corp. )
Bates,A.K. ( IBM Corp. and SEMATECH )
Van,Peski,C.K. ( SEMATECH )
2 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
470
Page(to):
479
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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