Laser pattern-generation technology below 0.25 ｦﾌm

Laser pattern-generation technology below 0.25 ｦﾌm

Author(s):: Allen,P.C. ( Etec Systems,Inc. )
Publication title:: Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3334
Pub. Year:: 1998
Page(from):: 460
Page(to):: 468
Pub. info.:: Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819427793 [0819427799]
Language:: English
Call no.:: P63600/3334
Type:: Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

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