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Inorganic antireflective coating process for deep-UV lithography

Author(s):
He,Q. ( Texas Instruments Inc. )
Lee,W.W. ( Texas Instruments Inc. )
Hanratty,M.A. ( Texas Instruments Inc. )
Rogers,D. ( Texas Instruments Inc. )
Xing,G. ( Texas Instruments Inc. )
Singh,A. ( Texas Instruments Inc. )
Zielinski,E. ( Texas Instruments Inc. )
2 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
337
Page(to):
346
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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