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Bottom-ARC optimization methodology for O.25-ヲフm lithography and beyond

Author(s):
Op,de,Beeck,M. ( IMEC (Belgium) )
Vandenberghe,G. ( IMEC (Belgium) )
Jaenen,P. ( IMEC (Belgium) )
Zhang,F.-H. ( IMEC (Belgium) )
Delvaux,C. ( IMEC (Belgium) )
Richardson,P. ( IMEC (Belgium) )
van,Puyenbroeck,I. ( IMEC (Belgium) )
Ronse,K. ( IMEC (Belgium) )
Lamb,III,J.E. ( Brewer Science,Inc. )
van,der,Hilst,J.B.C. ( ASM Japan )
van,Wingerden,J. ( Philips Research Labs. (Netherlands) )
6 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. date:
1998
Page(from):
322
Page(to):
336
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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