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Accurate proximity correction method with total-process proximity-based correction factor(TCF)

Author(s):
Hashimoto,K. ( Toshiba Corp. (Japan) )
Usui,S. ( Toshiba Corp. (Japan) )
Hasebe,S. ( Toshiba Corp. (Japan) )
Murota,M. ( Toshiba Corp. (Japan) )
Nakayama,T. ( Toshiba Corp. (Japan) )
Matsuoka,F. ( Toshiba Corp. (Japan) )
Inoue,S. ( Toshiba Corp. (Japan) )
Kobayashi,S. ( Toshiba Corp. (Japan) )
Yamamoto,K. ( Toshiba Corp. (Japan) )
4 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. date:
1998
Page(from):
224
Page(to):
233
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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