0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction

0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction

Author(s):

Kling,M.E. ( Motorola )

Lucas,K.D. ( Motorola )

Reich,A. ( Motorola )

Roman,B.J. ( Motorola )

Chuang,H. ( Motorola )

Gilbert,P.V. ( Motorola )

Grobman,W.D. ( Motorola )

Travis,E.O. ( Motorola )

Tsui,P. ( Motorola )

Vuong,T. ( Motorola )

West,J.P. ( Motorola )

6 more

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

204

Page(to):

214

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

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