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CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ヲフm gate printing

Author(s):
Ronse,K. ( IMEC (Belgium) )
Maenhoudt,M. ( IMEC (Belgium) )
Marschner,T. ( IMEC (Belgium) )
Van,den,hove,L. ( IMEC (Belgium) )
Streefkerk,B. ( ASM Lithography BV (Netherlands) )
Finders,J. ( ASM Lithography BV (Netherlands) )
van,Schoot,J. ( ASM Lithography BV (Netherlands) )
Luehrmann,P.F. ( ASM Lithography BV (Netherlands) )
Minvielle,A.M. ( Advanced Micro Devices,Inc. )
4 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. date:
1998
Page(from):
56
Page(to):
66
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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