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Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices

Author(s):
Cha,D.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
Kye,J.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
Seong,N.-G. ( Samsung Electronics Co.,Ltd. (Korea) )
Kang,H.-Y. ( Samsung Electronics Co.,Ltd. (Korea) )
Cho,H.-K. ( Samsung Electronics Co.,Ltd. (Korea) )
Moon,J.-T. ( Samsung Electronics Co.,Ltd. (Korea) )
1 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
46
Page(to):
54
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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