Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances
- Author(s):
- Liu,H.-Y. ( Hewlett Packard Labs. )
- Karklin,L. ( Numerical Technologies,Inc. )
- Wang,Y.-T. ( Numerical Technologies,Inc. )
- Pati,Y.C. ( Numerical Technologies,Inc. )
- Publication title:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3334
- Pub. Year:
- 1998
- Page(from):
- 2
- Page(to):
- 14
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- Language:
- English
- Call no.:
- P63600/3334
- Type:
- Conference Proceedings
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