Parameters affecting megasonic power transmittance in the megasonic cleaning process
- Author(s):
Kim,Y.H. ( Samsung Electronics Co.,Ltd. (Korea) ) Park,J.H. ( Samsung Electronics Co.,Ltd. (Korea) ) Lee,K.H. ( Samsung Electronics Co.,Ltd. (Korea) ) Choi,S.W. ( Samsung Electronics Co.,Ltd. (Korea) ) Yoon,H.S. ( Samsung Electronics Co.,Ltd. (Korea) ) Sohn,J.M. ( Samsung Electronics Co.,Ltd. (Korea) ) - Publication title:
- Photomask and X-Ray Mask Technology V
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3412
- Pub. Year:
- 1998
- Page(from):
- 455
- Page(to):
- 462
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- Language:
- English
- Call no.:
- P63600/3412
- Type:
- Conference Proceedings
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