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Ion projection lithography (Invited Paper)

Author(s):
Melngailis,J. ( Univ.of Maryland/College Park (USA) )
Loschner,H. ( Ion Microfabrication Systems GmbH (Austria) )
Stengl,G. ( Ion Microfabrication Systems GmbH (Austria) )
Berry,I.L. ( Microelectronics Research Lab. (USA) )
Mondelli,A.A. ( Science Applications International Corp. (USA) )
Gross,G. ( Siemens AG (Germany) )
1 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
369
Page(to):
384
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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