Mask CD quality assurance specifications for 0.25-ｦﾌm devices with a practical lithography window

Mask CD quality assurance specifications for 0.25-ｦﾌm devices with a practical lithography window

Author(s):

Gunji,T. ( Sony Corp. (Japan) )
Kitagawa,T. ( Sony Corp. (Japan) )
Tsuboi,K. ( Sony Corp. (Japan) )

Publication title:

Photomask and X-Ray Mask Technology V

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3412

Pub. Year:

1998

Page(from):

329

Page(to):

335

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819428646 [0819428647]

Language:

English

Call no.:

P63600/3412

Type:

Conference Proceedings

Details

TDL ID:	ZA00017848
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1998 : 5th
Conf. info. (Venue):	Kawasaki, Japan
Conf. info. (Date):	1998.04.09-1998.04.10

Similar Items:

1 Conference Proceedings CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing Ronse,K., Maenhoudt,M., Marschner,T., Van,den,hove,L., Streefkerk,B., Finders,J., van,Schoot,J., Luehrmann,P.F., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Electron-beam mask writing system for 0.25-ｦﾌm device generation Mizuno,K., Kawasaki,K., Itoh,H., Satoh,H., Someda,Y., Saitou,N. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Manufacturing feasibility of OPC masks for 0.25-ｦﾌm rule devices Kawahira,H., Katsumata,M., Tsudaka,K., Ogura,A., Tomita,M., Nozawa,S. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Optical proximity correction considering mask manufacturability and its application to 0.25-ｦﾌm DRAM for enhanced device performance Park,C.-H., Rhie,S.-U., Choi,J.-H., Park,J.-S., Seo,H.-W., Kim,Y.-H., Park,Y.-K., Han,W.-S., Lee,W.-S., Kong,J.-T. SPIE - The International Society for Optical Engineering
3 Conference Proceedings 0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction Kling,M.E., Lucas,K.D., Reich,A., Roman,B.J., Chuang,H., Gilbert,P.V., Grobman,W.D., Travis,E.O., Tsui,P., Vuong,T., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Characterization and optimization of CD control for 0.25-ｦﾌm CMOS applications Ronse,K., Beeck,M.Opde, Yen,A., Kim,K.-H., hove,L.Van den SPIE-The International Society for Optical Engineering
4 Conference Proceedings Reticle contributions to CD uniformity for 0.25-ｦﾌm DUV lithography Kuijten,J.P., Duray,F., der,Kinderen,T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Implementation of a closed-loop CD and overlay controller for sub-0.25-ｦﾌm patterning Sturtevant,J.L., Weilemann,M.R., Green,K.G., Dwyer,J., Robertson,E., Hershey,R.R. SPIE-The International Society for Optical Engineering
5 Conference Proceedings New electron-beam mask-writing system for 0.25-ｦﾌm lithography Satoh,H., Someda,Y., Saitou,N., Kawasaki,K., Itoh,H., Mizuno,K. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Migrating deep-UV lithography to the 0.25-ｦﾌm regime:issues and outlook Orvek,K.J., Dass,S.K., Gruber,L., Dumford,S.A., Piasecki,M., Pollard,G.W., Fink,I.D. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Practical implementation of alternating PSM to memory device of sub-0.25-ｦﾌm technology Ahn,C.-N., Kim,H.-E., Kim,H.-B., Baik,K.-H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography Tritchkov,A., Rieger,M.L., Stirniman,J.P., Yen,A., Ronse,K., Vandenberghe,G., hove,L.Van den SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12