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Subresolution assist feature masks for 0.2-ｦﾌm window pattern formation

Author(s):
Yasuzato,T. ( NEC Corp. (Japan) )
Ishida,S. ( NEC Corp. (Japan) )
Tanabe,H. ( NEC Corp. (Japan) )
Andou,A. ( NEC Corp. (Japan) )
Kamata,T. ( NEC Corp. (Japan) )
Tonooka,Y. ( NEC Corp. (Japan) )
Shigemura,H. ( NEC Corp. (Japan) )
2 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
319
Page(to):
328
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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