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Fine-pattern process with negative tone resist

Author(s):
Hoshino,E. ( Fujitsu Ltd. (Japan) )
Uraguchi,M. ( Fujitsu Ltd. (Japan) )
Yamamoto,Y. ( Fujitsu Ltd. (Japan) )
Sato,Y. ( Fujitsu Ltd. (Japan) )
Minagawa,K. ( Fujitsu Ltd. (Japan) )
Suzuki,K. ( Fujitsu Ltd. (Japan) )
Watanabe,K. ( Fujitsu Labs. Ltd. (Japan) )
2 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
214
Page(to):
219
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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