Fine-pattern process with negative tone resist
- Author(s):
Hoshino,E. ( Fujitsu Ltd. (Japan) ) Uraguchi,M. ( Fujitsu Ltd. (Japan) ) Yamamoto,Y. ( Fujitsu Ltd. (Japan) ) Sato,Y. ( Fujitsu Ltd. (Japan) ) Minagawa,K. ( Fujitsu Ltd. (Japan) ) Suzuki,K. ( Fujitsu Ltd. (Japan) ) Watanabe,K. ( Fujitsu Labs. Ltd. (Japan) ) - Publication title:
- Photomask and X-Ray Mask Technology V
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3412
- Pub. Year:
- 1998
- Page(from):
- 214
- Page(to):
- 219
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- Language:
- English
- Call no.:
- P63600/3412
- Type:
- Conference Proceedings
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