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Chemical-amplification posotive-resist design for 0.18-ｦﾌm reticle fabricaton using the 50-kV HL-800M electron-beam system

Author(s):
Arai,T. ( Hitachi,Ltd. (Japan) )
Sakamizu,Y. ( Hitachi,Ltd. (Japan) )
Soga,T. ( Hitachi,Ltd. (Japan) )
Satoh,H. ( Hitachi,Ltd. (Japan) )
Katoh,K. ( Hitachi Chemical Co.,Ltd. (Japan) )
Shiraishi,H. ( Hitachi,Ltd. (Japan) )
Hoga,M. ( Hitachi,Ltd. (Japan) )
2 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
190
Page(to):
195
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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