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Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication

Author(s):
Tsai,W. ( Intel Corp. (USA) )
Chen,F. ( Intel Corp. (USA) )
Kamna,M. ( Intel Corp. (USA) )
Chegwidden,S. ( Intel Corp. (USA) )
Labovitz,S.M. ( Intel Corp. (USA) )
Farnsworth,J.N. ( Intel Corp. (USA) )
Dao,G.T. ( Intel Corp. (USA) )
2 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. date:
1998
Page(from):
149
Page(to):
162
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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