Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication
- Author(s):
Tsai,W. ( Intel Corp. (USA) ) Chen,F. ( Intel Corp. (USA) ) Kamna,M. ( Intel Corp. (USA) ) Chegwidden,S. ( Intel Corp. (USA) ) Labovitz,S.M. ( Intel Corp. (USA) ) Farnsworth,J.N. ( Intel Corp. (USA) ) Dao,G.T. ( Intel Corp. (USA) ) - Publication title:
- Photomask and X-Ray Mask Technology V
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3412
- Pub. Year:
- 1998
- Page(from):
- 149
- Page(to):
- 162
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- Language:
- English
- Call no.:
- P63600/3412
- Type:
- Conference Proceedings
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