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Status of x-ray mask development at the IBM Advanced Mask Facility

Author(s):
Racette,K.C. ( IBM Microelectronics Div. (USA) )  
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
99
Page(to):
105
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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