Method to devise multiphase complex mask in submicron lithography

Method to devise multiphase complex mask in submicron lithography

Author(s):

Luo,X. ( Institute of Optics and Electronics )
Yao,H.

Publication title:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3873

Pub. Year:

1999

Vol.:

Part2

Page(from):

987

Page(to):

994

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

Language:

English

Call no.:

P63600/3873

Type:

Conference Proceedings

Details

TDL ID:	ZA00017632
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology
Conf. info. (Number):	1999 : 19th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	1999.09.15-1999.09.17

Similar Items:

1 Conference Proceedings New method for improving the practical resolution of complex patterns in sub-half-micron lithography Chen,X., Luo,X., Yao,H., Xiao,Q., Yu,G. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Detection and repair of multiphase defects on alternating phase-shift masks for DUV Lithography Nagashige,S., Hayashi,K., Akima,S., Takahashi,H., Chiba,K., Yamada,Y., Matsuzawa,Y. SPIE - The International Society for Optical Engineering
2 Conference Proceedings OAI and PSM used in 193-nm lithography Yao,H., Luo,X., Chen,X., Feng,B. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Detection of submicron phase defects on multiphase random logic reticles Spence,C.A., Nistler,J.L., Arnold,W.H., Emery,D., Zurbrick,L.S., Prakash,D.P., Chang,X., Khanna,S., Leback,B., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Resolution enhancement in optical lithography using polarized film mask Yu, G., Lin, W., Chen, X., Xing, T., Yao, H. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Principle of a new deformable mirror actuated by liquid drops [6149-66] Wang, H., Luo,X., Yao,H., Du,C. SPIE - The International Society of Optical Engineering
4 Conference Proceedings New mask having functions of OAI and PSM to realize sub-0.2-ｦﾌm patterns with 248 nm in microlithography Luo,X., Yao,H., Chen,X., Feng,B. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Resolution enhancement in optical lithography with chromium wire-grid polarization mask Yu, G., Lin, W., Xing, T., Yao, H. SPIE - The International Society of Optical Engineering
5 Conference Proceedings PBS resist profile studies for submicron mask lithography R.L. Dean, H.Y. Lem, C. Sauer, H. Chang Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Generalized inverse lithography methods for phase-shifting mask design X. Ma, G. R. Arce SPIE - The International Society of Optical Engineering
6 Conference Proceedings DEVise and the Java Screen:visualization on the web Yao,H., Wenger,K., Livny,M. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Validation and application of a mask model for inverse lithography T. H. Dam, X. Zhou, D. Chen, A. Adamov, D. Peng Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12