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TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

Author(s):
Koo,S.-S. ( Hyundai Electronics Industries Co.Ltd. )
Hur,I.-B.
Koo,Y.-M.
Baik,K.-H.
Choi,I.-H.
Kim,L.-J.
Park,K.-T.
Shin,C.
3 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. date:
1999
Vol.:
Part2
Page(from):
969
Page(to):
978
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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