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Next-generation lithography mask development at the NGL Mask Center of Competency

Author(s):
Lercel,M.J. ( IBM Microelectronics Div. )
Brooks,C.J.
Racette,K.C.
Magg,C.
Lawliss,M.
Caldwell,N.
Jeffer,R.
Collins,K.W.
Barrett,M.
Nash,S.C.
Trybendis,M.J.
Bouchard,L.
7 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. date:
1999
Vol.:
Part2
Page(from):
804
Page(to):
813
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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