Carbon stain effects from SEM exposure

Author(s):

• Grantz,J. ( DuPont Photomasks,Inc )
• Henderson,R.K.
• Wood,J.L.

Publication title:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3873

Pub. Year:

1999

Vol.:

Part2

Page(from):

668

Page(to):

676

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

Language:

English

Call no.:

P63600/3873

Type:

Conference Proceedings