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Die-to-die and die-to-database capability analysis for advanced OPC inspection

Author(s):
Chen,J.X. ( DuPont Photomasks,Inc )
Russell,D.R.
Terhune,R.
Riddick,J.
Kalk,F.D.
Lucas,K.D.
Falch,B.J.
2 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. date:
1999
Vol.:
Part2
Page(from):
626
Page(to):
634
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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