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Analysis of photomask CD errors depending on development methods

Author(s):
Moon,S.-Y. ( Samsung Electronics Co.Ltd. )
Ki,W.-T.
Cha,B.-C.
Choi,S.-W.
Yoon,H.-S.
Sohn,J.-M.
1 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. date:
1999
Vol.:
Part2
Page(from):
573
Page(to):
576
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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