Mask substrate requirements and development for extreme ultraviolet lithography(EUVL)
- Author(s):
- Tong,W.M. ( Lawrence Livermore National Lab. )
- Taylor,J.S.
- Hector,S.D.
- Shell,M.K
- Publication title:
- 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3873
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 421
- Page(to):
- 428
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780849434686 [084943468X]
- Language:
- English
- Call no.:
- P63600/3873
- Type:
- Conference Proceedings
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