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ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography

Author(s):
Onodera,T. ( Semiconductor Leading Edge Technologies,Inc. )
Matsuo,T.
Nakazawa,K.
Miyazaki,J.
Ogawa,T.
Morimoto,H.
Haraguchi,T.
Fukuhara,N.
Otaki,M.
Takeuchi,S.
5 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
337
Page(to):
343
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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