Sub-0.18-ｦﾌm line/space lithography using 248-nm scanners and assisting feature OPC masks

Sub-0.18-ｦﾌm line/space lithography using 248-nm scanners and assisting feature OPC masks

Author(s):

Lin,H.T. ( Taiwan Semiconductor Manufacturing Co.Ltd. )
Lin,J.C.H.
Chiu,C.S.G.
Wang,Y.Y.
Yen,A.

Publication title:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3873

Pub. Year:

1999

Vol.:

Part1

Page(from):

307

Page(to):

315

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

Language:

English

Call no.:

P63600/3873

Type:

Conference Proceedings

Details

TDL ID:	ZA00017632
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology
Conf. info. (Number):	1999 : 19th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	1999.09.15-1999.09.17

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