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Development of simplified process for KrF excimer halftone mask with chrome-shielding method

Author(s):
Kobayashi,S. ( Sharp Corp. )
Oka,N.
Watanabe,K.
Ohmori,K.
Inoue,M.
Iguchi,K.
1 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. date:
1999
Vol.:
Part1
Page(from):
288
Page(to):
296
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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