Blank Cover Image

System architecture choices for an advanced mask writer(100 to 130 nm)

Author(s):
Chakarian,V. ( Etec Systems,Inc )
III,F.Raymond
Saver,C.A.
Babin,S.V.
Innes,R.
Sagle,A.L.
Hofmann,U.
Shamoun,B.
Trost,D.
Ghanbari,A.
Abboud,F.E.
6 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
228
Page(to):
242
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Initial benchmarking of a new electron-beam raster pattern generator for 130-to 100-nm maskmaking

Sauer,C.A., Abboud,F.E., Babin,S.V., Chakarian,V., Ghanbari,A., Innes,R., Trost,D., III,F.Raymond

SPIE - The International Society for Optical Engineering
7 Conference Proceedings High-productivity mask writer with broad operating range

Baik,K.-H., Chakarian,V., Dean,B., Lu,M., Naber,R.J., Newman,T.H., Wiltse,M., Abboud,F.E.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Elements of an advanced pattern generator for 130- to 100-nm maskmaking

Chakarina,V., Sauer,C.A., Shamoun,B., Chiles,F., Trost,D., Zywno,M., Hofmann,U., Teizel,R., Prior,R., III,F.Raymond, …

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Chabala,J.M., Abboud,F.E., Dean,R.L., Weaver,S., Cole,D.M., Sauer,C.A., F.Raymond ?, Hofmann,U.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Design considerations for an electron-beam pattern generator for the 130-nm generation of masks

Abboud, F. E., Babin, S. V., Chakarian, V., Ghanbari, A., Innes, R., Raymond III, F., Sagle, A. L., Sauer, C. A.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Extension of graybeam writing for the 130-nm technology node

Chabala,J.M., Abboud,F.E., Sauer,C.A., Weaver,S., Lu,M., Pearce-Percy,H.T., Hofmann,U., Vernon,M., Ton,D., Cole,D.M., …

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Lithographic performance results for a new 50-kV electron-beam mask writer

Chakarian,V., Bylciw,S.R., Sauer,C.A., Trost,D., Zywno,M., Teitzel,R., Raymond Ⅲ,F., Abboud,F.E.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices

Abboud,F.E., Alexander,D., Coleman,T.P., Cook,A., Gasiorek,L., Naber,R.J., Raymond,F., Sauer,C.A.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings 100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Abboud,F.E., Baik,K.-H., Chakarian,V., Cole,D.M., Daniel,J.P., Dean,R.L., Gesley,M.A., Lu,M., Naber,R.J., Newman,T.H., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Pattern generation requirements for mask making beyond 130 nm

Abboud,F.E., Gesley,M.A., Maldonado,J.R.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Raster scan patterning solution for 100-and 70-nm OPC masks

Abboud, F.E., Baik, K.-H., Chakarian, V., Cole, D. M., Dean, R.L., Gesley M.A., Gillman. H., Moore, W.C., Mueller, M., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Advanced electron-beam pattern generation technology for 180-nm masks

Abboud,F.E., Sauer,C.A., Wang,W., Vernon,M., Prior,R., Pearce-Percy,H.T., Cole,D.M., Mankos,M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12