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Extension of graybeam writing for the 130-nm technology node

Author(s):
Chabala,J.M. ( Etec Systems,Inc )
Abboud,F.E.
Sauer,C.A.
Weaver,S.
Lu,M.
Pearce-Percy,H.T.
Hofmann,U.
Vernon,M.
Ton,D.
Cole,D.M.
Naber,R.J.
6 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
36
Page(to):
48
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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