Effective OPC pattern generation using chemically amplified resist 0.13-ヲフm design rule masks
- Author(s):
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 705
- Page(to):
- 715
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ヲフm reticle fabrication
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
0.13-ヲフm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Comparison study for sub-0.13-ヲフm lithography between ArF and KrF lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Chemical-amplification posotive-resist design for 0.18-ヲフm reticle fabricaton using the 50-kV HL-800M electron-beam system
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Analysis of resist pattern collapse and optimization of DUV process for patterning sub-0.20-ヲフm gate line
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Application of deep-UV attenuated PSM to 0.2-ヲフm contact hole patterning technology
SPIE-The International Society for Optical Engineering |