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CrOxFy as a material for attenuated phase-shift masks in ArF lithography

Author(s):
Nakazawa,K. ( Semiconductor Leading Edge Technologies,Inc. )
Matsuo,T.
Onodera,T.
Morimoto,H.
Mohri,H.
Hatsuta,C.
Hayashi,N.
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
682
Page(to):
687
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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