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Development of halftone phase-shift blank and mask fabrication for ArF lithography

Author(s):
Suda,H. ( HOYA Corp. )
Mitsui,N.
Nozawa,O.
Ohtsuka,H.
Takeuchi,M.
Nishida,N.
Ohkubo,Y.
Ushida,M.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
671
Page(to):
681
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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