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Newly developed mask inspection system with DUV laser illumination

Author(s):
Oohashi,K. ( Toshiba Corp, )
Inoue,H.
Nomura,T.
Ono,A.
Tabata,M.
Suzuki,H.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
452
Page(to):
461
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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