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150-nm mask fabrication using thin ZEP 7000 resist,GHOST,and dry etch for the MEBES 5000 pattern generator

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. date:
2000
Page(from):
243
Page(to):
251
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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