Blank Cover Image

Application of MICP source for next-generation photomask process

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
218
Page(to):
225
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Kwon, H.-J., Min, D.-S., Jang, P.-J., Chang, B.-S., Choi, B.-Y., Jeong, S.-H.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings CD variation sources of photomask

Kim,B.G., Choi,S.W., Yu,Y.H., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Dry etching technology of Cr and MoSi layers using high-density plasma source

Kwon,H.-J., Oh,K.-S., Chang,B.-S., Choi,B.-Y., Park,K.-H., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Improved process control of photomask fabrication in e-beam lithography

Cha,B.-C., Park,J.-H., Choi,Y.-H., Kim,J.-M., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings A study of post-exposure baking effect for CAR process in photomask fabrication

Park, D.-I., Seo, S.-K., Jeong, W.-G., Park, E.-S., Lee, J.-H., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I., Park, E.-S., Lee, J.-H., Jeong, W.-G., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of multiple-wavelength absorption endpoint system in photomask dry etcher

Min, D.-S., Jang, P.-J., Kwon, H.-J., Choi, B.-Y., Jeong, S.H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Optical pumping experiments on next-generation light sources

Moon, S.J., Fournier, K.B., Scott, H., Chung, H.-K., Lee, R.W.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Dry etching of Cr layer and its loading effect

Kwon,H.-J., Min,D.-S., Jang,P.-J., Chang,B.-S., Choi,B.-Y., Park,K.-H., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings ArF halftone PSM cleaning process optimization for next-generation lithography

Son,Y.-S., Jeong,S.-H., Kim,J.-B., Kim,H.-S.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Jeong, W.-G., Park, D.-I., Park, E.-S., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Y. -M. Kang, S. -J. Kim, J. -B. Park, W. Chang, S. -W. Park, J. -S. Kim, H. -K. Cho, H. -K. Oh

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12