Dose latitude dependency on resist contrast in e-beam mask lithography
- Author(s):
Cha,B.-C. ( Samsung Electronics Co.,Ltd. ) Moon,S.-Y. Ki,W.-T. Yang,S.-H. Choi,S.-W. Han,W.-S. Yoon,H.-S. Sohn,J.-M. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 200
- Page(to):
- 209
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
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